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Equipment
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Ebeam lithography
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Raith EBPG5000 – Ebeam tool
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Tool Description
Writing Strategy
Conductive Substrate
Opaque Reflective Surface
Alignment
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CATS
BEAMER
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MMA / PMMA
ZEP 520A
CSAR 62
HSQ / FOX16
nLOF
Electra 92
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Control Computer
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Alignment Microscope
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Keep It Simple
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Sawatec HP-200 hot plates
Plade Solvents wet bench
Water / Base wet bench
Präziterm hot plate
Terra universal nitrogen cabinet
Photolithography
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DUV (λ = 248nm) inline track & stepper
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ASML PAS 5500/350C
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ASML 4x reticle template
ASML 4x reticle visual guide
ASML 4x reticle design guide
TEL Clean Track ACT-8
Automatic coaters and developers
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Süss ACS200 GEN3
EVG 150
Hamatech HMR900
Manual coaters
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Sawatec SM-200 for photoresists
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Sawatec SM-200 Manual
Sawatec LSM-250 & HP-200
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Sawatec LSM-250 & HP-200 Manual
Sawatec LSM-200 & HP-401-Z
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Sawatec LSM-200 & HP-401-Z Manual
Sawatec LSM-250 for MISC polymers
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Sawatec LSM-250 MISC Manual
Exposure tools: laser writers
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Heidelberg Instruments VPG200
Heidelberg Instruments MLA150 – 1 & 2
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MLA150 Manual
HIMT “convert” Manual (MLA150)
Nanoscribe Photonic Professional GT+
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Nanoscribe PPGT+ Manual
Nanoscribe Alignment Manual
Describe Manual
Exposure tools: mask-aligners
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Süss MA6Gen3
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MA6 Gen3 Manual
MA6 Gen3 Assisted Alignment Manual
MA6 Gen3 Film Masks Manual
Süss MA6/BA6
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MA6 Manual
BA6 Manual
Süss MJB4
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MJB4 Manual
Nanoimprint Lithography
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NILT CNI v3.0
Photolithography wet benches
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Plade Solvent Z01
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Plade Solvent, Lift-off Manual
Arias Solvent Z13
Arias Base Z13
Arias “Lift-off” Z12
Additional hot plates / ovens
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YES 310TA, Vacuum cure & HMDS vapor prime oven
Heraeus T6060, multipurpose oven
Despatch LCD1-16NV-3, biocompatible oven
Etching
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Ion Beam Etching
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Veeco Nexus IBE350
Plasma Etching
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STS Multiplex ICP
Alcatel AMS 200 SE
SPTS APS
TEL Unity Me
SPTS Rapier
Oxford – PlasmaPro100 Cobra
Resist Strip and Descum
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Oxford PRS900
Tepla 300
Tepla GiGAbatch
ESI 3511 Downstream Plasma Asher
Jelight UVO Cleaner
Gas Etching
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SPTS uEtch
SPTS Xactix X4 – XeF2 Silicon etching system
Grinding / Polishing
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STEAG MECAPOL 460 – CMP (CHEMICAL MECHANICAL POLISHING)
Alpsitec E460 F – CMP (Chemical Mechanical Polishing)
Post CMP Cleaning System GnP Cleaner 428
DAG810 – AUTOMATIC SURFACE GRINDER
Wet Etching
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UFT Piranha
UFT Resist
Plade Oxide
Plade Metal
Plade Six Sigma KOH
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Protek Protective Stop Layer
Tousimis Automegasamdri 915B – Critical Point Dryer
Arias Acid
Arias Base #1 & #2
Solvent bench Z14
Thin films
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LPCVD / Dry or wet oxidation / Alloying / Doping / Diffusion / Densification / Annealing / ALD
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Centrotherm furnaces
Plade RCA
ATOMIC LAYER DEPOSITION BENEQ TFS200 (ALD 1)
ATOMIC LAYER DEPOSITION BENEQ TFS200 (ALD 2)
RTP JETFIRST 200
ROVAK Flash Lamp Annealing System Semi-Line 3.0
PECVD
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Oxford Instruments PlasmaPro 100 ICPCVD
Corial D250L PECVD
Evaporation
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Alliance-Concept EVA 760
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User Manual
Recipes
Steps
References
Available PVD targets in CMi
Precious material billing
Leybold Optics LAB 600H
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User Manual
Recipes
Recipe Categories
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Vacotec
Vacotec VACO 250
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User Manual
Boats
Plassys MEB550SL3 UHV Evaporator
Sputtering
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Pfeiffer SPIDER 600
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Recipes
User Manual
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Alliance-Concept DP 650
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Recipes
Steps
Measurement Ref.
User Manual
Available PVD targets in CMi
Precious material billing
Pulsed Laser Deposition
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Solmates SMP 800
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Available PVD targets in CMi
Electroplating / Parylene coating
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Silicet Electroplating unit, Cu
Comelec C-30-S
Metrology
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AFM
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Bruker FastScan AFM
FIB / SEM / EDX / ProSEM
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FEI Nova 600 NanoLab
Zeiss LEO 1550
Zeiss MERLIN
EDX
Zeiss SEM Crossbeam 550
ProSEM software
XPS / AES available at MHMC
Mechanical profilometers
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KLA Tencor P-17
Bruker Dektak XT
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Optical measurement
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Krüss DSA-30E
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Krüss DSA-30E Manual
Krüss / ImageJ Surface Tension Manual
Krüss Surface Free Energy Models
Sopra GES 5E
Woollam RC2
Bruker Contour X
Nanospec AFT-6100
FilMetrics F20-UV
Filmetrics F54
Toho Technology FLX 2320-S
Electrical measurement
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Filmetrics R50 – 200 – 4PP
AIT CMT-SR2000N 4-Point Probe Measurement System
MPI TS150 Probe Station
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MPI TS150 probe station Manual
Optical microscopy
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Microscopes at CMi
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Leica DM8000
Nikon Optiphot 200, inspection microscope
Nikon Optiphot 150, inspection microscope
Nikon MM 40, inspection and 2-D metrology microscope
Mitutoyo, inspection microscope
Nikon Eclipse LV150 microscope
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Wafer Bonding
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EVG 510, wafer to wafer bonding line
Wire Bonding
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TPT HB10
F&S Bondtec 56i
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Finetech FINEPLACER lambda, Die Bonder
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OPTEC LSV3
T-Tech QC5000S-E
Dicing – Cutting
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Disco DAD321
Graphtec RoboPro CE5000-40-CRP
Printing
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NanoImprint EHN-3250
Miscellaneous
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PDMS line
Dry Film Laminators
Surfx Atomflo 400L
Idonus shadow mask aligner
Neytech Qex Furnace
Furnace ATV PEO-601
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III/V Lab – IPHYS
Process
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Ebeam Lithography
Photolithography
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Layout Design
Mask Fabrication
Photoresists available in CMi
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AZ 1512 HS
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AZ 1512 HS Datasheet
AZ ECI 3007
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AZ ECI 3007 Datasheet
AZ ECI 3027
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AZ ECI 3027 Datasheet
AZ 10XT-07
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AZ 10XT-07 Datasheet
AZ 10XT-20
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AZ 10XT-20 Datasheet
AZ 10XT-60
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AZ 10XT-60 Datasheet
AZ 40XT
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AZ 40-XT Datasheet
LOR 5A / AZ 1512 HS
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LOR 5A Datasheet
AZ NLOF 2020
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AZ nLOF 2020 Datasheet
AZ 15nXT
SU-8
M108Y
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M108Y Datasheet
M35G
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M35G Datasheet
PI 2610 & PI 2611
Photolithography Nomenclature
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Available PVD targets in CMi
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Gene Expression Core Facility
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Overview
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ORFeome Collaboration (OC)
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My ORF of interest is missing
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C1 Single-Cell Auto Prep system
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Leica DM5500
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Protein Production and Purification
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ECPS – Laminar-turbulent patterns
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Solid Sampling
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Heating Bits
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EPFL Science Seed Fund
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3R – Replace, Reduce, Refine
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