
RESERVATION RULES AND BOOKING FEES POLICY:
- Booking: maximum 24 time slots (30 minutes) allowed at any time.
- Reservation names must correspond to operators.
- Billing : Wafer process flow start/stop
- In case of parallel process flow, all flows must be ended to log out from the equipment
- This equipment is subject to penalty fees in case of user’s no-show.
Contents:
I. Introduction
The ACS200 Gen3 is a modular cluster tool for coating & development of i-line photoresists. It is equipped with:
- Two loading/unloading ports (one cassette for coating, one cassette for development)
- A wafer centering station
- Two spin-coating modules
- One developement module, with both puddle and spray options
- Two stacks of hotplates (9 in total) & coolplates (3 in total), including an additional HMDS-priming module
The individual processing modules are fed by a central robot.
The tool can handle standard SEMI-wafers of 100mm and 150mm diameter (on request), both opaque (silicon, SOI, …) or transparent (glass, fused-silica, sapphire,…).
Sequences consist in specific flow of sub-recipes running in individual modules. Several sequences, started from a single or both cassettes, can be active in parallel. The flow is managed in real time by the software and optimized for maximum throughput or for prioritization of critical steps.
Photoresists currently available on the ACS 200: AZ ECI 3007, AZ ECI 3027, AZ 10XT-20, AZ 10XT-60, AZ 15nXT, AZ 40XT.
II. Process flow library
Sequences are stored in a single database library. 10 sections of 1000 sequences of recipes are organized as follow:
- 0000 to 0999: PR coating – 4 inch wafers
- 1000 to 1999: PR development – 4 inch wafers
- 2000 to 3999: PR coating & development – 6 inch wafers (configuration request)
- 4000 to 4999: High topography recipes
- 8000 to 8999: Preventive maintenance and developement
- 9000 to 9999: User custom sequences
The nomenclature for sequence names can be found here.
Specific Modules








III. User manuals
Step-by-step operation
IV. Links
- Available resists at CMi