Ebeam – Fundamental principles

Tool Description

Explanation of basic tool components and concepts, such as writing fields, stitching, dose, frequency, etc.

Writing Strategy

Explanation of image formation using a round Gaussian beam spot and rectangular pixel grid. Beam size as a function of beam current.

Conductive Substrate

Ebeam litho at 100kV can only be performed on electrically conductive substrates.

Opaque Reflective Surface

Sample surface must be opaque and reflective to enable correct in-situ laser height measurement during exposure.


Written patterns can be aligned to pre-existing structures on the wafers/chips. Overlaying of multiple levels is possible.