Arias Solvent Z13

To be read first:

  • SAFETY OPERATOR MANUAL TO OPERATE ON CMi WETBENCHES  (HERE)
  • Solvent chemistry: Do not breath unsafe NMP solvent vapor during processing.
  • Good working practice: When done, empty beakers in the dedicated waste bottles. Clean the work area of glass beakers, paper wipes, tweezers and make sure it is dry (no unidentified liquid).
  • Please immediately inform the CMi staff in case of problems with the equipment.

RESERVATION RULES AND BOOKING FEES POLICY:

  1. This wet bench is free to use, with no booking and no login.
  2. Maximum 2 persons working at the same time.

Contents:

  1. Introduction
  2. Equipement description
  3. Users manuals
  4. Links
  5. Pictures gallery

I. Introduction

The Arias Solvent wet bench in Zone 13 is dedicated to wet processes involving photoresists with solvent chemistry only.

The processes that are allowed on this bench are:

  1. Photoresist stripping on wafers and chips (Remover 1165 – NMP or SVC-14 – DMSO)
  2. Photoresist stripping for metal lift-off on wafers and chips (Remover 1165 – NMP or SVC-14 – DMSO)
  3. Development of exposed SU-8 wafers (PGMEA)
  4. Development of exposed Nanoscribe photoresists.
  5. General wafer cleaning (acetone, IPA, N2 drying)

Any other processes involving solvent chemistry, but not listed above, should be discussed with the equipment responsible.

Although no dangerous chemicals are used on this bench and safety dressing is not required, we encourage users to read and understand the wet bench safety manual.

II. Equipment description

Overview:

The Arias Solvent wet bench in Z13 is a free-to-use work area to perform solvent  chemistry in beakers fo single wafers and chips. A maximum of two users should be working at the same time on the bench.

A free work area does not mean you should not follow good and safe working practices. Please respect other users!

Actual layout:

  • Right side: water tap & sinks for rinsing
  • Left side: solvent tub & long term beaker storage
  • Back: 2x water Bain-Marie units for heating and ultrasonic agitation (US)

Good Working Practices:

Chemicals:

Chemicals that are allowed on the Arias Solvent wet bench are:

  • acetone (red)
  • IPA (orange)
  • PGMEA (blue-green)
  • Remover 1165 / NMP (white, check label)
  • SVC-14 / DMSO (white, check label)

Make sure to empty used chemicals in the appropriate waste bottles!

III. User manuals

IV. Links

V. Pictures gallery