Arias “Lift-off” Z12

To be read first:

  • SAFETY OPERATOR MANUAL TO OPERATE ON CMi WETBENCHES  (HERE)
  • Solvent chemistry: Do not breath unsafe NMP solvent vapor during processing.
  • Good working practice: When done, empty beakers in the dedicated waste bottles. Clean the work area of glass beakers, paper wipes, tweezers and make sure it is dry (no unidentified liquid).
  • When done, turn the light off and close the main window!
  • Please immediately inform the CMi staff in case of problems with the equipment.

RESERVATION RULES AND BOOKING FEES POLICY:

  1. Reservation names must correspond to operators.

Contents:

  1. Introduction
  2. Equipement description
  3. Users manuals
  4. Links
  5. Pictures gallery

I. Introduction

The Arias “Stripping and Lift-off” wet bench in Zone 12 is dedicated to long-duration wet processes involving photoresists with solvent chemistry only.

The processes that are allowed on this bench are:

  1. Photoresist stripping on wafers and chips (Remover 1165 – NMP or SVC-14 – DMSO)
  2. Photoresist stripping for metal lift-off on wafers and chips (Remover 1165 – NMP or SVC-14 – DMSO)

Any other processes involving solvent chemistry, but not listed above, should be discussed with the equipment responsible.

Although no dangerous chemicals are used on this bench and safety dressing is not required, we encourage users to read and understand the wet bench safety manual.

In case of long processes, unnatended beakers should be clearly labelled with username, solvent type and expected return date/time.

II. Equipment description

Overview:

The Arias “Stripping and Lift-off” wet bench in Z12 is a  work area dedicated to long processes involving solvent chemistry (stripping or lift-off) in beakers for single wafers and chips.

Actual layout:

  • Right side: water tap & sinks for rinsing
  • Left side:  beaker drying and storage
  • Back: 3x water Bain-Marie units for heating and ultrasonic agitation (US)
  • Under the bench: waste bottles

Control panels:

Controllers for the light, window and ultrasonic baths are located on the front panels.

Good Working Practices:

Chemicals:

Chemicals that are allowed on the Arias Solvent wet bench are:

  • IPA (orange)
  • Remover 1165 / NMP (white, check label)
  • SVC-14 / DMSO (white, check label)

Make sure to empty used chemicals in the appropriate waste bottles!

III. User manuals

IV. Links

V. Pictures gallery