Please download the SU-8 runcard to find parameters for all processing steps (Gersteltec GM and Kayaku 3000 series):

Process flow

  Recommended process Alternative process

Substrate Pretreat Oxygen plasma
(Tepla 300, Z11)
Piranha cleaning
(Wet bench, Z02)
Coat Manual coating
(Sawatec LSM250, Z13)
Edge Bead Removal (optional) Manual EBR
(Sawatec LSM250, Z13)
Relaxation + Soft Bake Hotplate soft baking
(Sawatec HP200, Z13)

i-line exposure (MJB4, Z13 or MA6 Gen3, Z01)

Direct laser writing, 365nm (MLA150-2, Z16)

Broadband exposure
(MA6, Z06)

Post Exposure Bake (PEB) Hotplate baking
(Sawatec HP200, Z13)
Develop Manual development in PGMEA
(Solvent Bench, Z13)
Rinse & Dry Rinse with isopropanol, dry with nitrogen gun Isopropanol + spin rinse dry
(Semitool SRD, Z01)
Hard Bake (optional) Hotplate curing
(Sawatec HP200, Z13)
Oven curing
(Heraeus oven, Z1)
Observation Microscopes