Conferences

First B-dot measurements in the RAID device, an alternative negative ion source for DEMO neutral beams

R. Jacquier; R. Agnello; B. Pouradier Duteil; P. Guittienne; A. Howling et al. 

2019. Symposium on Fusion Technology, Giardini Naxos, Sicily, Italy, September 16-21, 2019. p. 1140-1144. DOI : 10.1016/j.fusengdes.2019.02.025.

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Helicon wave-generated plasmas for negative ion beams for fusion

I. Furno; R. Agnello; U. Fantz; A. Howling; R. Jacquier et al. 

2017. 22 Topical Conference on Radio-Frequency Power in Plasmas, Aix en Provence, 30 May – 2 June 2017. p. 03014. DOI : 10.1051/epjconf/201715703014.

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Spectroscopic measurements of hydrogen dissociation degree and H− production in resonant antenna-generated helicon plasmas

C. Marini; B. Duval; I. Furno; A. Howling; R. Jacquier et al. 

2016. 43rd EPS Conference on Plasma Physics, Leuven, Belgium, July 4-8, 2016. p. P4.110.

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RF inductive probe to measure plasma complex conductivity

A. Howling; P. Guittienne; R. Jacquier; I. Furno 

69th Annual Gaseous Electronics Conference, Bochum, Germany, October 10-14, 2016.

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A novel helicon plasma source for negative ion beams for fusion

I. Furno; R. Agnello; B. Duval; C. Marini; A. Howling et al. 

5th International Symposium on Negative Ions, Beams and Sources – NIBS, Oxford, UK, 12th – 16th September 2016.

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RF antennas as plasma monitors

A. Howling; P. Guittienne; I. Furno 

Frontiers of Low Temperature Plasma Diagnostics, Porquerolles, France, May 24-28, 2015.

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Resonant rf network antennas for inductively-coupled plasma sources

A. A. Howling; P. Guittienne; C. Hollenstein; I. Furno 

2014. 41st European Physical Society Conference on Plasma Physics, Berlin, 23-27 June 2014. p. P2.139.

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RF breakdown in low pressure gases in small (millimetric) gaps with non-planar surfaces

B. Legradic; A. Howling; C. Hollenstein 

2010. 37th IEEE International Conference on Plasma Science (ICOPS), Norfolk, VA, USA, June 20-24, 2010. DOI : 10.1109/PLASMA.2010.5534421.

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Effect of surface structures on RF breakdown

B. Legradic; A. Howling; C. Hollenstein 

High Frequency Gas Breakdown Workshop, in 7th International Conference on Reactive Plasmas (ICRP) and 63rd Gaseous Electronics Conference (GEC), Paris, France, October 4-8, 2010.

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RF breakdown in low pressure gases between small (millimetric) gap parallel plate electrodes with surface structures

B. Legradic; A. Howling; C. Hollenstein 

2010. 7th ICRP and 63rd GEC, Paris, France, October 4-8, 2010. p. TF1-003.

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Review of Large Area Plasma Processing at CRPP from 1990-2010

A. Howling 

Invitation to Nankai University, Tianjin, China, March 28 – April 3, 2010.

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Diagnostics and Simulation for Large Area RF Plasma Deposition Reactors

A. Howling 

Invitation to Nankai University, Tianjin, China, March 28 – April 3, 2010.

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Non-intrusive plasma diagnostics for the deposition of large area thin film silicon

A. A. Howling; B. Strahm; C. Hollenstein 

2009. 6th Symposium on Thin Films for Large Area Electronics held at the E-MRS Spring Meeting, Strasbourg, France, May 26-30, 1008. p. 6218-6224. DOI : 10.1016/j.tsf.2009.02.053.

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Hydrogen-dominated plasma, due to silane depletion, for microcrystalline silicon deposition (Invited paper)

A. Howling 

American Vacuum Society AVS 56th International Symposium and Exhibition, San Jose, California, USA, November 8-13, 2009.

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Reactor design for large area thin film silicon deposition (Invited tutorial)

A. Howling 

23rd International Conference on Amorphous and Nanocrystalline Semiconductors, Utrecht, The Netherlands, August 23-28, 2009.

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Plasma modelling and reactor design (Invited)

A. Howling 

2nd International Workshop on Thin Film Silicon Solar Cells IWTFSSC-2, Berlin, Germany, April 21-23, 2009.

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Study of the microstructure transition width from amorphous to microcrystalline silicon as a function of the input silane concentration

B. Strahm; A. Feltrin; G. Bugnon; F. Meillaud-Sculati; C. Ballif et al. 

2009. SPIE conference on Thin Film Solar Technology, San Diego, DOI : 10.1117/12.825799.

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Crystallinity Uniformity of Microcrystalline Silicon Thin Films Deposited in Large Area Radio Frequency Capacitively-coupled Reactors

A. Nathan; J. Yang; S. Miyazaki; J. Hou; A. Flewitt et al. 

2008. Symposium on Amorphous and Polycrystalline Thin-Film Silicon Science and Technology held at the 2008 MRS Spring Meeting, San Francisco, CA, March 25-28, 2008. p. 3-14. DOI : 10.1557/PROC-1066-A01-01.

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Plasma edge simulations by finite elements using Comsol

C. Hollenstein; A. Howling 

2008. COMSOL conference, Hannover, November 4-6, 2008.

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Plasma diagnostics as a tool for process optimization: the case of microcrystalline silicon deposition

B. Strahm; A. A. Howling; C. Hollenstein 

2007. 34th European-Physical-Society Conference on Plasma Physics, Warsaw, POLAND, Jul 02-06, 2007. p. B411-B418. DOI : 10.1088/0741-3335/49/12B/S38.

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Plasma diagnostics as a tool for process optimization:

B. Strahm; A. Howling; C. Hollenstein 

2007. 34th EPS Conference on Plasma Physics, Warsaw Congress Centre, Poland, 02 July 2007.

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Optimization of microcrystaline silicon deposition efficiency

B. Strahm; A. Howling; L. Sansonnens; C. Hollenstein 

2007. AVS 53rd International Symposium Exhibition, San Francisco, 12 November 2006.

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Fast growth of microcrystalline silicon solar cells on LP-CVD ZnO in industrial KAI PECVD reactors

L. Feitknecht; F. Freitas; C. Bucher; B. Strahm; A. Howling et al. 

2006. EPSEC Conference.

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Application of the shaped electrode technique to a large area rectangular capacitively-coupled plasma reactor to suppress standing wave nonuniformity

L. Sansonnens; H. Schmidt; A. Howling; C. Hollenstein; C. Ellert et al. 

2005. AVS 52st Int. Symposium & Exhibition.

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Elimination of electromagnetic non-uniformities in large-area RF plasma reactors used for thin-film deposition

A. Howling; L. Sansonnens; J. Schmitt; J. Ballutaud; H. Schmidt et al. 

2004. Société Suisse de Physique.

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Challenges in RF plasma disposition on square-meter substrates

L. Sansonnens; J. Schmitt; A. Howling; J. Ballutaud; H. Schmidt et al. 

2003. 14th Int. Colloquium on Plasma Processes, Juan-Les-Pins, Antibes, France, June/July 2003.

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Consequences of non-uniform RF plasma potential in large-area capacitive reactors

J. Ballutaud; C. Hollenstein; A. Howling; L. Sansonnens; H. Schmidt et al. 

2003. 16th International Symposium on Plasma Chemistry.

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Plasma Deposition of p-i-n Devices using a Single PECVD Chamber: Study of the Boron Contamination

J. Ballutaud; A. Howling; L. Sansonnens; C. Hollenstein; U. Kroll et al. 

2002. 29th EPS Conference on Controlled Fusion and Plasma Physics.

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Mechanism of substrate charging after plasma processing

A. Howling; A. Belinger; B. Bulkin; L. Delaunay; M. Elyaakoubi et al. 

2001. 15th International Symposium on Plasma Chemistry, Orleans, France, July 2001. p. 33-39.

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Measurement of substrate charging after plasma processing

A. Howling; L. Sansonnens; C. Hollenstein; A. Belinger; J. Perrin 

2001. Frontiers in Low Temperature Plasma Diagnostics IV.

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The Influence of Plasma Chemistry on the Deposition of Microcrystalline Silicon for Large Area Photovoltaic Solar Cells

A. A. Howling; L. Sansonnens; J. Ballutaud; F. Grangeon; T. Delachaux et al. 

2000.  p. 518-521.

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RF plasma deposition uniformity on square-meter substrates

L. Sansonnens; A. Howling; J. Ballutaud; C. Hollenstein 

2000. 27th EPS Conference on Controlled Fusion and Plasma Physics.

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