Focused Ion Beam (FIB)

CMi has established a strong collaboration with the CIME facility to ensure continued access to advanced FIB technology for all our users.

Thanks to this partnership, CMi users can now benefit from two state-of-the-art FIB instruments available at CIME, each offering distinct and complementary capabilities for cross-sectioning, patterning, and advanced nano-fabrication:

SERVICE (preferred):

For users with occasional or one-time FIB needs, CMi offers a service-based access mode. This allows you to request FIB work to be performed by experienced staff without undergoing full training. It’s the preferred option for users who require rapid turnaround, do not need frequent access, or whose tasks do not justify full autonomy on the equipment. Service sessions are carried out by CMi staff, ensuring quality results while saving your time.

TRAINING:

Training is available for users who require regular and autonomous access to FIB tools. Due to the complexity and precision of FIB processes, training is comprehensive and consists of two hands-on sessions (3 hours each), followed by a mandatory proficiency check by a CIME staff member. This ensures users are fully capable of operating under standard procedures. Training is a significant time investment, for both users and staff, so it is reserved for users with ongoing or project-specific needs.

Helios G4 PFIB UXe

Helios G4 PFIB UXe is dedicated to large volume 3D characterization, cross sectioning, Ga+ free TEM sample preparation and precise micromachining.

 

  • Elstar™ SEM Electron Column with high-current UC+ monochromator technology – ultimate image resolution at
    low beam energies
  • Xenon Plasma FIB (PFIB 2.0) Column
    • FIB current range: 10 pA – 2.5 μA
  • Gas injection system: C, Pt, W
  • Detectors:
    • ETD (Everhart Thornley Detector) – secondary electron (SE) and backscatter electron (BSE) mode
    • TLD (Through Lens Detector) – SE and BSE collection
    • ICE – collects secondary ions (SI) or electrons (SE, BSE)
    • ICD (In-Column Detector) – detects BSE scattered close to the electron beam axis, it provides high Z-contrast signal
    • UltraDry EDS detector

Zeiss CrossBeam 540

Zeiss CrossBeam 540/550 is a new generation of dual beam tools. It is a combination of a high resolution field emission scanning electron microscope (FE-SEM) with the processing ability of a next-generation focused ion beam (FIB).

This tool is dedicated especially for 3D tomography; cross sectioning and TEM lamella preparation.

Operated since 2018.

Equipped with:

  • standard Everhart-Thornley secondary-electron (SE) detector; Gemini II column with Inlens and EsB (Energy selective BSE) detectors; Oxford Inst. Ultim Max EDX detector
  • Gas injection system (GIS) – carbon and platinum
  • Kleindiek manipulator