Alliance-Concept EVA-451

clean room

Located halfway between development and production tool, this vacuum evaporator has been developed so as to offer multiple configurations.

– 8 metals available : 

Au :      99.999%
Ni :       99.995 %
Pd :      99.95%
Pt :       99.99%
Cr :       99.994-99.998%
Al :       99.99%
Ti :       99.995%
Ag :      99.99%

– Deposition on several piece of wafer until max full 4” wafer (one)

– Working distance: 53cm between crucible and sample

– Sample rotation and cooled down

– Load lock

– Full automatic process

The thickness measurement is achieved using quartz crystal balance, remotely interfaced to the PLC sequences controller. This software allows to realize, in automatic mode, complex multilayers