Alliance-Concept EVA-451

clean room

Located halfway between development and production tool, this vacuum evaporator has been developed so as to offer multiple configurations.

– 8 metals available : Al, Cr, Ni, Ti, Pt, Au, Pd, Ag

– Different size of substrat holder: 

                               – 4 inch wafer

                               – 3 inch wafer

                               – 2 inch wafer

                               – Small piece of wafer

– Working distance: 53cm between crucible and sample

– Sample rotation

– Load lock

– Full automatic process

The thickness measurement is achieved using quartz crystal balance, remotely interfaced to the PLC sequences controller. This software allows to realize, in automatic mode, complex multilayers