RIBER compact 21 reactor
-Gallium
-Indium
-Aluminum
-Silicon (dopant)
-Magnesium (dopant)
-Ammonia
-Nitrogen Plasma
- 3”
- 2” (1/2 and 1/4 of 2”)
- 10×10 mm2 square wafer
- custom sizes available on request
Our system is dedicated for GaN, AlN, InGaN, and AlGaN growth, using NH3 as V-element precursor, or N2-plasma
