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Tencor Alpha-Step 500
The manual of the Tencor Alpha-Step 500 is available:
In
English
.
In
French
.
Center of MicroNanoTechnology
Back: Center of MicroNanoTechnology
Reservations
Organisation
Back: Organisation
About CMi
Become a CMi member
Access & Security
Back: Access & Security
How to access CMi cleanrooms
Materials introduction in CMi cleanrooms
IT rules in CMi
Safety Rules
Emergency procedures
Staff
Back: Staff
Photo Gallery
Organization chart
Phone numbers
Processing fees
Back: Processing fees
Invoiced fees & User status
Penalties rules
Precious material
Refund demand
CMi Services
General rates – CMi user account required
Partners & Links
Projects
Cleanroom photo gallery
Picture of the Month
Back: Picture of the Month
Rules for Submission
Honorable Runner-ups
Winners 2023
Winners 2022
Winners 2021
Winners 2020
Winners 2019
Winners 2018
Winners 2017
Winners 2016
Honorable 2023
Honorable 2022
Honorable 2021
Honorable 2020
Honorable 2019
Honorable 2018
Honorable 2017
Honorable 2016
News & Events
Equipment
Back: Equipment
Ebeam lithography
Back: Ebeam lithography
Raith EBPG5000 – Ebeam tool
Back: Raith EBPG5000 – Ebeam tool
Administration
Fundamental principles
Back: Fundamental principles
Tool Description
Writing Strategy
Conductive Substrate
Opaque Reflective Surface
Alignment
Data Preparation
Back: Data Preparation
CATS
BEAMER
CJOB
Batch_job
Ebeam Resists
Back: Ebeam Resists
MMA / PMMA
ZEP 520A
CSAR 62
HSQ / FOX16
nLOF
Electra 92
Operation Manuals
Back: Operation Manuals
Control Computer
Holders
Alignment Microscope
Loading & Unloading
Tips
Back: Tips
Keep It Simple
What NOT To Do
Sawatec SM-150 for ebeam resists
Sawatec HP-200 hot plates
Plade Solvents wet bench
Water / Base wet bench
Präziterm hot plate
Terra universal nitrogen cabinet
Photolithography
Back: Photolithography
DUV (λ = 248nm) inline track & stepper
Back: DUV (λ = 248nm) inline track & stepper
ASML PAS 5500/350C
Back: ASML PAS 5500/350C
ASML 4x reticle template
ASML 4x reticle visual guide
ASML 4x reticle design guide
TEL Clean Track ACT-8
Automatic coaters and developers
Back: Automatic coaters and developers
Süss ACS200 GEN3
EVG 150
Hamatech HMR900
Manual coaters
Back: Manual coaters
Sawatec SM-200 for photoresists
Back: Sawatec SM-200 for photoresists
Sawatec SM-200 Manual
Sawatec LSM-250 & HP-200
Back: Sawatec LSM-250 & HP-200
Sawatec LSM-250 & HP-200 Manual
Sawatec LSM-200 & HP-401-Z
Back: Sawatec LSM-200 & HP-401-Z
Sawatec LSM-200 & HP-401-Z Manual
Sawatec LSM-250 for MISC polymers
Back: Sawatec LSM-250 for MISC polymers
Sawatec LSM-250 MISC Manual
Exposure tools: laser writers
Back: Exposure tools: laser writers
Heidelberg Instruments VPG200
Heidelberg Instruments MLA150 – 1 & 2
Back: Heidelberg Instruments MLA150 – 1 & 2
MLA150 Manual
HIMT “convert” Manual (MLA150)
Nanoscribe Photonic Professional GT+
Back: Nanoscribe Photonic Professional GT+
Nanoscribe PPGT+ Manual
Nanoscribe Alignment Manual
Describe Manual
Exposure tools: mask-aligners
Back: Exposure tools: mask-aligners
Süss MA6Gen3
Back: Süss MA6Gen3
MA6 Gen3 Manual
MA6 Gen3 Assisted Alignment Manual
MA6 Gen3 Film Masks Manual
Süss MA6/BA6
Back: Süss MA6/BA6
MA6 Manual
BA6 Manual
Süss MJB4
Back: Süss MJB4
MJB4 Manual
Nanoimprint Lithography
Back: Nanoimprint Lithography
NILT CNI v3.0
Photolithography wet benches
Back: Photolithography wet benches
Plade Solvent Z01
Back: Plade Solvent Z01
Plade Solvent, Lift-off Manual
Arias Solvent Z13
Arias Base Z13
Arias “Lift-off” Z12
Additional hot plates / ovens
Back: Additional hot plates / ovens
YES 310TA, Vacuum cure & HMDS vapor prime oven
Heraeus T6060, multipurpose oven
Despatch LCD1-16NV-3, biocompatible oven
Etching
Back: Etching
Ion Beam Etching
Back: Ion Beam Etching
Veeco Nexus IBE350
Plasma Etching
Back: Plasma Etching
STS Multiplex ICP
Alcatel AMS 200 SE
SPTS APS
TEL Unity Me
SPTS Rapier
Oxford – PlasmaPro100 Cobra
Resist Strip and Descum
Back: Resist Strip and Descum
Oxford PRS900
Tepla 300
Tepla GiGAbatch
ESI 3511 Downstream Plasma Asher
Jelight UVO Cleaner
Gas Etching
Back: Gas Etching
SPTS uEtch
SPTS Xactix X4 – XeF2 Silicon etching system
Grinding / Polishing
Back: Grinding / Polishing
STEAG MECAPOL 460 – CMP (CHEMICAL MECHANICAL POLISHING)
Alpsitec E460 F – CMP (Chemical Mechanical Polishing)
Post CMP Cleaning System GnP Cleaner 428
DAG810 – AUTOMATIC SURFACE GRINDER
Wet Etching
Back: Wet Etching
UFT Piranha
UFT Resist
Plade Oxide
Plade Metal
Plade Six Sigma KOH
Back: Plade Six Sigma KOH
Protek Protective Stop Layer
Tousimis Automegasamdri 915B – Critical Point Dryer
Arias Acid
Arias Base #1 & #2
Solvent bench Z14
Thin films
Back: Thin films
LPCVD / Dry or wet oxidation / Alloying / Doping / Diffusion / Densification / Annealing / ALD
Back: LPCVD / Dry or wet oxidation / Alloying / Doping / Diffusion / Densification / Annealing / ALD
Centrotherm furnaces
Plade RCA
ATOMIC LAYER DEPOSITION BENEQ TFS200 (ALD 1)
ATOMIC LAYER DEPOSITION BENEQ TFS200 (ALD 2)
RTP JETFIRST 200
ROVAK Flash Lamp Annealing System Semi-Line 3.0
PECVD
Back: PECVD
Oxford Instruments PlasmaPro 100 ICPCVD
Corial D250L PECVD
Evaporation
Back: Evaporation
Alliance-Concept EVA 760
Back: Alliance-Concept EVA 760
User Manual
Recipes
Steps
References
Available PVD targets in CMi
Precious material billing
Leybold Optics LAB 600H
Back: Leybold Optics LAB 600H
User Manual
Recipes
Recipe Categories
Available PVD targets in CMi
Processing fees
Bühler Alzenau LTE – Long Throw Evaporator
Vacotec
Vacotec VACO 250
Back: Vacotec VACO 250
User Manual
Boats
Plassys MEB550SL3 UHV Evaporator
Sputtering
Back: Sputtering
Pfeiffer SPIDER 600
Back: Pfeiffer SPIDER 600
Recipes
User Manual
Available PVD targets in CMi
Precious material billing
Alliance-Concept DP 650
Back: Alliance-Concept DP 650
Recipes
Steps
Measurement Ref.
User Manual
Available PVD targets in CMi
Precious material billing
Pulsed Laser Deposition
Back: Pulsed Laser Deposition
Solmates SMP 800
Back: Solmates SMP 800
Available PVD targets in CMi
Electroplating / Parylene coating
Back: Electroplating / Parylene coating
Silicet Electroplating unit, Cu
Comelec C-30-S
Metrology
Back: Metrology
AFM
Back: AFM
Bruker FastScan AFM
FIB / SEM / EDX / ProSEM
Back: FIB / SEM / EDX / ProSEM
FEI Nova 600 NanoLab
Zeiss LEO 1550
Zeiss MERLIN
EDX
Zeiss SEM Crossbeam 550
ProSEM software
XPS / AES available at MHMC
Mechanical profilometers
Back: Mechanical profilometers
KLA Tencor P-17
Bruker Dektak XT
KLA Tencor D600
Optical measurement
Back: Optical measurement
Krüss DSA-30E
Back: Krüss DSA-30E
Krüss DSA-30E Manual
Krüss / ImageJ Surface Tension Manual
Krüss Surface Free Energy Models
Sopra GES 5E
Woollam RC2
Bruker Contour X
Nanospec AFT-6100
FilMetrics F20-UV
Filmetrics F54
Toho Technology FLX 2320-S
Electrical measurement
Back: Electrical measurement
Filmetrics R50 – 200 – 4PP
AIT CMT-SR2000N 4-Point Probe Measurement System
MPI TS150 Probe Station
Back: MPI TS150 Probe Station
MPI TS150 probe station Manual
Optical microscopy
Back: Optical microscopy
Microscopes at CMi
Back: Microscopes at CMi
Leica DM8000
Nikon Optiphot 200, inspection microscope
Nikon Optiphot 150, inspection microscope
Nikon MM 40, inspection and 2-D metrology microscope
Mitutoyo, inspection microscope
Nikon Eclipse LV150 microscope
Packaging – Miscellaneous
Back: Packaging – Miscellaneous
Wafer Bonding
Back: Wafer Bonding
EVG 510, wafer to wafer bonding line
Wire Bonding
Back: Wire Bonding
TPT HB10
F&S Bondtec 56i
Die Bonding
Back: Die Bonding
Finetech FINEPLACER lambda, Die Bonder
Laser Machining – Milling
Back: Laser Machining – Milling
OPTEC LSV3
T-Tech QC5000S-E
Dicing – Cutting
Back: Dicing – Cutting
Disco DAD321
Graphtec RoboPro CE5000-40-CRP
Printing
Back: Printing
NanoImprint EHN-3250
Miscellaneous
Back: Miscellaneous
PDMS line
Dry Film Laminators
Surfx Atomflo 400L
Idonus shadow mask aligner
Neytech Qex Furnace
Furnace ATV PEO-601
Furnace ATV SRO-702
III/V Lab – IPHYS
Process
Back: Process
Ebeam Lithography
Photolithography
Back: Photolithography
Layout Editors & Templates
Mask/Reticle Fabrication
Photoresists available in CMi
Back: Photoresists available in CMi
AZ 1512 HS
Back: AZ 1512 HS
AZ 1512 HS Datasheet
AZ ECI 3007
Back: AZ ECI 3007
AZ ECI 3007 Datasheet
AZ ECI 3027
Back: AZ ECI 3027
AZ ECI 3027 Datasheet
AZ 10XT-07
Back: AZ 10XT-07
AZ 10XT-07 Datasheet
AZ 10XT-20
Back: AZ 10XT-20
AZ 10XT-20 Datasheet
AZ 10XT-60
Back: AZ 10XT-60
AZ 10XT-60 Datasheet
AZ 40XT
Back: AZ 40XT
AZ 40-XT Datasheet
LOR 5A / AZ 1512 HS
Back: LOR 5A / AZ 1512 HS
LOR 5A Datasheet
AZ NLOF 2020
Back: AZ NLOF 2020
AZ nLOF 2020 Datasheet
AZ 15nXT
SU-8
M108Y
Back: M108Y
M108Y Datasheet
M35G
Back: M35G
M35G Datasheet
PI 2610 & PI 2611
Photolithography on chips < 5mm * 5mm
Thin films
Back: Thin films
Available PVD targets in CMi
PVD definitions
Materials
Back: Materials
Silicon Wafers
SOI Wafers
Glass Wafers
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