{"text_format":"1","workbook":"xlsx","n_sheets":13,"sheets":["Summary","Setup","Gersteltec GM Runcard","Kayaku 3000 Runcard","Kayaku 3005","Kayaku 3010","Kayaku 3025","Kayaku 3050","GM 1040","GM 1050","GM 1060","GM 1070","GM 1075"],"not_rendered":{"charts":12,"images":0,"macros":1,"external_links":1,"defined_names":1,"comments":0,"pivot_tables":0},"unopened":[],"bounds":{"document_bytes":16777216,"sheet_cells":100000,"rows_first":2000,"rows_last":500,"rows_between":2000,"halvings":0,"cell_chars":16384,"cell_head_chars":4096},"cells_cut":0,"cells_raw":0,"read":"whole","date_system":"1900"}

{"sheet":"Summary","index":0,"n_rows":44,"n_cols":15,"rows_kept":44,"cut":false,"hidden":false,"merged":[[1,8,2,10],[36,1,37,2],[38,1,39,2],[21,1,22,2],[18,1,19,2],[6,4,6,5],[8,4,8,5],[16,1,17,2],[40,1,40,2],[36,4,37,5],[38,4,39,5],[28,7,28,8],[29,7,29,8],[36,7,37,8],[38,7,39,8],[28,13,28,14],[29,13,29,14],[20,4,20,5],[18,7,19,8],[16,13,17,14],[16,10,17,11],[16,7,17,8],[18,10,19,11],[20,10,20,11],[18,13,19,14],[18,4,19,5],[16,4,17,5],[22,10,23,11],[21,10,21,11]]}
[]
[null,null,null,null,null,null,null,null,"Don’t forget to enable Macros"]
[]
[null,"SU8 Processing - Cmi"]
[]
[]
[null,null,"Substrate :",null,"Si"]
[]
[null,null,"Resist : ",null,"Gersteltec GM 1000"]
[]
[null,null,"Target thickness :",null,100]
[]
[]
[]
[]
[]
[null,"1. Wafer Preparation",null,null,"2. Coating",null,null,"3. Pre-bake",null,null,"4. Exposure",null,null,"5.  PEB"]
[]
[null,"Tepla (Z2)",null,null,"VM 652 (Z6)",null,null,"Sawatec Hotplates (Z1 or Z13)",null,null,"MLA 150 (Z16)",null,null,"Sawatec Hotplates (Z1 or Z13)"]
[]
[null,"High Power","7 min",null,"GM 1075",null,null,"time [s]","temp [°C]",null,"Please find the dose in the resist",null,null,"time [s]","temp [°C]"]
[null,"NO Cr,Cu,Ag,Fe",null,null,"time [s]","temp [°C]",null,"Vacuum = OFF","N2 = ON",null,"table (web or desktop MLA)",null,null,"Vacuum OFF","N2 ON"]
[null,null,null,null,5,500,null,"1800-3600",30,null,"Mask-aligner i-line (Z1 or Z13)",null,null,10,30]
[null,null,null,null,5,500,null,3600,130,null,null,null,null,3000,90]
[null,null,null,null,{"$f":"(Setup!F3-500)/100","v":14},{"$f":"Setup!F3","v":1900},null,300,130,null,{"$f":"Setup!G3","v":177},"[mJ/cm2]",null,3600,90]
[null,null,null,null,40,{"$f":"Setup!F3","v":1900},null,3000,30,null,null,null,null,2700,60]
[null,null,null,null,1,{"$f":"(Setup!F3)+1000","v":2900},null,null,null,null,null,null,null,2700,30]
[null,null,null,null,1,{"$f":"Setup!F3","v":1900}]
[null,null,null,null,5,{"$f":"Setup!F3","v":1900},null,"If a segment exceeds 3000s",null,null,null,null,null,"If a segment exceeds 3000s"]
[null,null,null,null,{"$f":"Setup!F3/100","v":19},0,null,"Please divide in two segments",null,null,null,null,null,"Please divide in two segments"]
[null,null,null,null,0,0]
[]
[]
[]
[]
[]
[null,"6. Relaxation",null,null,"7. Development",null,null,"8. Hardbake (optional)"]
[]
[null,"Wafer Storage Box",null,null,"Plade Solvent (Z1)                Wet Bench Solvent (Z13)",null,null,"Hotplates Süss(Z1) or VWR(Z13)"]
[]
[null,"60 minutes",null,null,"time [s]","Solvent",null,"120 min","135°C"]
[null,null,null,null,180,"PGMEA"]
[null,null,null,null,120,"PGMEA"]
[null,null,null,null,60,"IPA"]

{"sheet":"Setup","index":1,"n_rows":10,"n_cols":10,"rows_kept":10,"cut":false,"hidden":true,"merged":[]}
["Substrate","Resist",null,"Resist Selected (Sheet name)",null,"Speed ","Exp. Dose [mJ/cm2]","Softbake [s]","PEB [s]","Dev [s]"]
["Si","Kayaku 3000",null,"GM 1075",null,{"$f":"(INDIRECT(\"'\"&Setup!$D$2&\"'!$C$13\"))","v":1902.0688943245525},{"$f":"(INDIRECT(\"'\"&Setup!$D$2&\"'!$D$13\"))","v":177.05859375},{"$f":"(INDIRECT(\"'\"&Setup!$D$2&\"'!$E$13\"))","v":0},{"$f":"(INDIRECT(\"'\"&Setup!$D$2&\"'!$F$13\"))","v":0},{"$f":"(INDIRECT(\"'\"&Setup!$D$2&\"'!$F$13\"))","v":0}]
["Mettalic layer","Gersteltec GM 1000",null,null,null,{"$f":"ROUNDDOWN(F2,-1)","v":1900},{"$f":"ROUNDDOWN(G2,0)","v":177},{"$f":"ROUNDDOWN(H2,1)","v":0},{"$f":"ROUNDDOWN(I2,2)","v":0},{"$f":"ROUNDDOWN(J2,2)","v":0}]
["Pyrex or Float glass"]
["Other"]
[]
[]
[]
[null,"Info : "]
[null,"update by M.Pillon, 01.11.2022"]

{"sheet":"Gersteltec GM Runcard","index":2,"n_rows":34,"n_cols":5,"rows_kept":34,"cut":false,"hidden":false,"merged":[[8,0,9,0],[23,0,24,0],[23,1,24,1],[3,1,3,4],[32,0,33,0],[32,1,33,1],[10,0,11,0],[10,1,11,1],[30,0,30,2],[26,0,26,3],[21,0,21,2],[19,0,19,3],[8,1,9,1]]}
[null,null,null,null,"Back to Gersteltec GM Summary"]
[]
["Step N°","Description","Equipment","Program / Parameters","Remarks"]
["X","PHOTOLITHOGRAPHY"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".1\")","v":"X.1"},"Wafer preparation","* See below","* ","*"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".2\")","v":"X.2"},"Coating","Z1 / Sawatec LSM200\nZ13 / Sawatec LSM250","Segment 1: Time: 5s / Speed: 500rpm\nSegment 2: Time: 5s / Speed: 500rpm\nSegment 3: Time: ((X-500)/100)s / Speed: Xrpm\nSegment 4: Time: 40s / Speed: Xrpm\nSegment 5: Time: 1s / Speed: X+1000rpm\nSegment 6: Time: 1s / Speed: Xrpm\nSegment 7: Time: 5s / Speed: Xrpm\nSegment 8: Time: (X/100)s / Speed: 0rpm\nSegment 9 -> 24: Time: 0s / Speed: 0rpm","\n\nX is the spinning speed to achieve the desired thickness.\n\nUse the \"Gersteltec GM Summary\" sheet to determine X."]
[{"$f":"CONCATENATE(LEFT(A4,3),\".3\")","v":"X.3"},"Relaxation time for better uniformity",null,"1040: 1 min.\n1050: 2-5 min.\n1060: 5-20 min.\n1070: 20-45 min.\n1075: 30-60 min.","Load on hotplate as coating is finished. Place a cleanroom paper under the wafers.\nChoose relaxation time based on thickness. Make sure hotplate is at 30°C standby."]
[{"$f":"CONCATENATE(LEFT(A4,3),\".4\")","v":"X.4"},"Softbake (SB)","Z1 / Sawatec HP401Z\nZ13 / Sawatec HP200","Segment 1: Time: 10 s / Temp.: 30°C\nBase Temp.: 30°C / Vaccum : ON / N2: ON\n\nSegment 2: Time: X s / Temp.: 130°C\nEnd segment: OFF / Vaccum : OFF / N2: ON                                                                                                                                                            \n\nSegment 3: Time: Y s / Temp.: 130°C\nEnd segment: OFF / Vaccum : OFF / N2: ON\n\nSegment 4: Time: X s / Temp.: 30°C\nEnd segment: ON / Vaccum : OFF / N2: ON\n\nSegment 5 -> 24: NO INFLUENCE","X is the ramp from 30°C to 130°C in seconds. Ramp time depends on material type:\n1040: 1200 s\n1050: 1500 s\n1060: 1800 s\n1070: 3000 s\n1075: 3000 s\n\nY is the baking step time. For a thickness more than 150 µm use 600 s, otherwise use 300 s."]
[{"$f":"CONCATENATE(LEFT(A4,3),\".5\")","v":"X.5"},"Exposure","Z1 / MA6 Gen3\nZ6 / MA6\nZ13 / MJB4","Process: Mask-Aligner \nExp. Time: X s with 20.0 mW/cm2 (i-line/broadband)\n\nExpose Type: Soft; Hard (HC Wait T.: 10 s); or Flood-E\nAlignment Gap: 30um\n","X is the time needed to get the desired exposure dose. Use the \"Gersteltec GM Summary\" sheet to determine X.\n\nIf X is > 20 s, split exposure with 10 s pause is recommended between each exposure step.\n\nValues are only an indication of the typical exposure dose and may be different for each process."]
[null,null,"Z5 / VPG200 ","Process: Laser Writing\nIntensity (20mm Head): Z %\nFocus: 0 (or negative)\nExposure Count : Y\n\nTotal Laser Intensity: Z x Y = X % \n\n","X is the total laser intensity (single pass x exposure count) needed to get the desired exposure dose. Use the \"Gersteltec GM Summary\" sheet to determine X.\n\nValues are only an indication of the typical exposure dose and may be different for each process."]
[{"$f":"CONCATENATE(LEFT(A4,3),\".6\")","v":"X.6"},"Post-exposure bake (PEB)","Z1 / Sawatec HP401Z\nZ13 / Sawatec HP200","Segment 1: Time: 10 s / Temp.: 30°C\nBase Temp.: 30°C / Vaccum : ON\n\nSegment 2: Time: X s / Temp.: Z °C\nEnd segment: OFF / Vaccum : OFF                                                                                                                                                            \n\nSegment 3: Time: Y s / Temp.: Z °C\nEnd segment: OFF / Vaccum : OFF\n\nSegment 4: Time: 2700 s / Temp.: 60 °C\nEnd segment: OFF / Vaccum : OFF\n\nSegment 5: Time: 2700 s / Temp.: 30°C\nEnd segment: ON / Vaccum : OFF\n\nSegment 6 -> 24: NO INFLUENCE\n","X is the the ramp up duration, and Y is the bake time, depending on material type.\n[Type: X, Y]\n1040: 1200 s, 900 s\n1050: 1200 s, 1200 s\n1060: 1800 s, 1800 s\n1070: 2400 s, 2400 s\n1075: 3000 s, 2x1800 s [*]\n\nZ is the bake temperature: 90C for Si, 85C for float glass. Place a single sheet of cleanroom paper under the substrates.\n\n[*]: the bake target is 3600 s. The maximum step duration is 3276 sec, therefore two segments must be set up with 1800 s each."]
[null,null,"Z1 / Accuplate\nZ1 / Dataplate","Segment 1: Ramp time: X min\nTemp.: Z °C; Step time: Y min\n\nSegment 2: Ramp ime: 90 min\nTemp.: 30°C; Step time: 0 min\n\nSegment 3 -> 5: NO INFLUENCE\n","X is the time for the ramp up, Y is the bake time, depending on material type.\n[Type: X, Y]\n1040: 20 min, 15 min \n1050: 20 min, 20 min\n1060: 30 min, 30 min\n1070: 40 min, 40 min\n1075: 50 min, 60 min\n\nZ is the bake temperature, 90C for Si, 85C for float glass. Place a single sheet of cleanroom paper under the substrates."]
[{"$f":"CONCATENATE(LEFT(A4,3),\".7\")","v":"X.7"},"Relaxation delay","Wafer storage box","From one hour to overnight, depending on thickness"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".8\")","v":"X.8"},"Development","Z1 / Plade Wet Bench\nZ13 / Wet Bench Solvent","PGMEA development in two separate baths","Development time:\n1040: 0.5 + 0.5 min\n1050 1 + 0.5 min\n1060: 1 + 1 min\n1070: 2 + 1 min\n1075: 3 + 2 min\n\nThe necessary time might be longer - if a reaction is visible within isopropanol (white residues appear), return to PGMEA for 1 min. Repeat until isopropanol does not react with dissolved SU8 residues."]
[{"$f":"CONCATENATE(LEFT(A4,3),\".9\")","v":"X.9"},"Rinse","Z1 / Plade Wet Bench\nZ13 / Wet Bench Solvent","Isopropanol","1 min"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".10\")","v":"X.10"},"Inspection","Z1 / uScope\nZ13 / uScope","Check for residues, resolution and alignment"]
[]
[]
[]
["* Necessary preparation depends on the substrate; see table below."]
[]
["Si and any other material not listed below"]
["Step N°","Description","Equipment","Program / Parameters","Remarks"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".1\")","v":"X.1"},"Wafer preparation","Z2 / Tepla Gigabatch","Prog. PR_strip_high_7min","7 min"]
[null,null,"Z11 / Tepla 300","Prog. 05","7 min"]
[]
["Metallic layers (in case the oxydation of the metallic layer may be a problem)"]
["Step N°","Description","Equipment","Program / Parameters","Remarks"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".1\")","v":"X.1"},"Wafer preparation","Z1 & Z13 / Hotplate","20 min / 150°C","Only dehydration\nNo HMDS !!!"]
[]
["Pyrex or Float glass"]
["Step N°","Description","Equipment","Program / Parameters","Remarks"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".1\")","v":"X.1"},"Wafer preparation","Z2 / Ultrafab Piranha\nZ2 / Tepla Gigabatch","\nProg. PR_strip_high_7min","Highly recommended\n7 min"]
[null,null,"Z2 / Ultrafab Piranha\nZ11 / Tepla 300","\nProg. 05","Highly recommended\n7 min"]

{"sheet":"Kayaku 3000 Runcard","index":3,"n_rows":32,"n_cols":5,"rows_kept":32,"cut":false,"hidden":false,"merged":[[3,1,3,4],[17,0,17,3],[19,0,19,2],[24,0,24,3],[29,0,29,2]]}
[null,null,null,null,"Back to Kayaku Summary"]
[]
["Step N°","Description","Equipment","Program / Parameters","Remarks"]
["X","PHOTOLITHOGRAPHY"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".1\")","v":"X.1"},"Wafer preparation","* See below","*","*"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".2\")","v":"X.2"},"Coating","Z13 Sawatec LSM250","Segment 1: Time: 5s / Speed: 500rpm\nSegment 2: Time: 5s / Speed: 500rpm\nSegment 3: Time: ((X-500)/100)s / Speed: Xrpm\nSegment 4: Time: 40s / Speed: Xrpm\nSegment 5: Time: 1s / Speed: X+1000rpm\nSegment 6: Time: 1s / Speed: Xrpm\nSegment 7: Time: 5s / Speed: Xrpm\nSegment 8: Time: (X/100)s / Speed: 0rpm\nSegment 9 -> 24: Time: 0s / Speed: 0rpm","\n\nX is the spinning speed to achieve the desired thickness.\n\nUse the \"Kayaku 3000 Summary\" sheet to determine X."]
[{"$f":"CONCATENATE(LEFT(A4,3),\".3\")","v":"X.3"},"Relaxation time","Z13 / Hotplate ","Not  recommended for Kayaku Su8"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".4\")","v":"X.4"},"Softbake (SB)","Z13 / Hotplate ","Softbake @ 95°C for X minutes","X is the softbake time.                                                                                                                                        Use the \"Kayaku 3000 Summary\" sheet to determine X."]
[{"$f":"CONCATENATE(LEFT(A4,3),\".5\")","v":"X.5"},"Exposure","Z13 / MJB4","Process: Photolithography\nExp. Time: X s (with 20.0 mW/cm2, mode CP)\n\nMode: Align + Exp\nExpose Type: Soft; Hard (HC Wait T.: 10s)\nAlignment Gap: 30um","X is the time needed to get the desired exposure dose.\nUse the \"Kayaku 3000 Summary\" sheet to determine X.\n\nIf X is > 20 s, split exposure with 10 s pause is recommended between each exposure step.\n\nValues are only a guide to find starting exposure dose and may be different for each process."]
[{"$f":"CONCATENATE(LEFT(A4,3),\".6\")","v":"X.6"},"Post-exposure bake (PEB)","Z13 / Hotplate ","PEB @ 65°C for 1 minutes & 95°C for X minutes","X is the PEB bake time.                                                                                                                                        Use the \"Kayaku 3000 Summary\" sheet to determine X."]
[{"$f":"CONCATENATE(LEFT(A4,3),\".7\")","v":"X.7"},"Relaxation delay","Wafer storage box","Minimum cooldown / relaxation : 10 minutes"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".8\")","v":"X.8"},"Development","Z13 / Wet Bench Solvent","PGMEA development in two separate baths","Development time:\nUse the \"Kayaku 3000 Summary\" sheet to determine the development time.\n\nThe necessary time might be longer - if a reaction is visible within isopropanol (white residues appear), return to PGMEA for 1 min. Repeat until isopropanol does not react with dissolved SU8 residues."]
[{"$f":"CONCATENATE(LEFT(A4,3),\".9\")","v":"X.9"},"Rinse","Z13 / Wet Bench Solvent","Isopropanol","1 min"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".10\")","v":"X.10"},"Inspection","Z13 / uScope","Check for residues, resolution and alignment"]
[]
[]
[]
["* Necessary preparation depends on the substrate; see table below."]
[]
["Si and any other material not listed below"]
["Step N°","Description","Equipment","Program / Parameters","Remarks"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".1\")","v":"X.1"},"Wafer preparation","Z11 / Tepla 300","Prog. 5","7 min"]
[]
[]
["Metallic layers (in case the oxydation of the metallic layer may be a problem)"]
["Step N°","Description","Equipment","Program / Parameters","Remarks"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".1\")","v":"X.1"},"Wafer preparation","Z13 / Hotplate","20 min / 150°C","Only dehydration\nNo HMDS !!!"]
[]
[]
["Pyrex or Float glass"]
["Step N°","Description","Equipment","Program / Parameters","Remarks"]
[{"$f":"CONCATENATE(LEFT(A4,3),\".1\")","v":"X.1"},"Wafer preparation","Z2 / Ultrafab Piranha\nZ11 / Tepla 300","\nProg. 5","Highly recommended\n7 min"]

{"sheet":"Kayaku 3005","index":4,"n_rows":13,"n_cols":8,"rows_kept":13,"cut":false,"hidden":true,"merged":[]}
["Kayaku 3005"]
["Spin speed\n[rpm]","Film Thickness\n[um]",null,"Film Thickness\n[um]","Typical exposure dose\n[mJ/cm2]","Softbake Time","PEB Time","Dev time"]
[1000,10,null,10,200,3,2,3]
[2000,7.5,null,4,100,2,1,1]
[3000,6,null,"linear - a",{"$f":"(E4-E3)/($D$4-$D$3)","v":16.666666666666668},{"$f":"(F4-F3)/($D$4-$D$3)","v":0.16666666666666666},0.16666666666666666,0.33333333333333331]
[4000,5,null,"linear - b",{"$f":"E4-E5*$D$4","v":33.333333333333329},{"$f":"F4-F5*$D$4","v":1.3333333333333335},0.33333333333333337,-0.33333333333333326]
[5000,4.5,null,"ax+b"]
[]
[]
[]
[]
[null,"Target thickness\n[um]","Spin speed\n[rpm]","Exposure dose\n[mJ/cm2]","Softbake time [s]","PEB time [s]","Dev time [s]"]
["Zone 13",{"$f":"Summary!E11","v":100},{"$f":"(B13/332.56)^(-1/0.504)","v":10.850665414803927},{"$f":"E5*$B$13+E6","v":1700},{"$f":"(F5*$B$13+F6)*60","v":1079.9999999999998},{"$f":"(G5*$B$13+G6)*60","v":1019.9999999999998},{"$f":"(H5*$B$13+H6)*60","v":1979.9999999999995}]

{"sheet":"Kayaku 3010","index":5,"n_rows":13,"n_cols":8,"rows_kept":13,"cut":false,"hidden":true,"merged":[]}
["Kayaku 3010"]
["Spin speed\n[rpm]","Film Thickness\n[um]",null,"Film Thickness\n[um]","Typical exposure dose\n[mJ/cm2]","Softbake Time","PEB Time","Dev time"]
[1000,18.5,null,15,200,10,4,6]
[2000,13,null,8,125,5,2,4]
[3000,10.7,null,"linear - a",{"$f":"(E4-E3)/($D$4-$D$3)","v":10.714285714285714},{"$f":"(F4-F3)/($D$4-$D$3)","v":0.7142857142857143},0.2857142857142857,0.2857142857142857]
[4000,9.5,null,"linear - b",{"$f":"E4-E5*$D$4","v":39.285714285714292},{"$f":"F4-F5*$D$4","v":-0.71428571428571441},-0.28571428571428559,1.7142857142857144]
[5000,8.6999999999999993,null,"ax+b"]
[]
[]
[]
[]
[null,"Target thickness\n[um]","Spin speed\n[rpm]","Exposure dose\n[mJ/cm2]","Softbake time [s]","PEB time [s]","Dev time [s]"]
["Zone 13",{"$f":"Summary!E11","v":100},{"$f":"(B13/474.21)^(-1/0.471)","v":27.238423646907616},{"$f":"E5*$B$13+E6","v":1110.7142857142856},{"$f":"(F5*$B$13+F6)*60","v":4242.8571428571431},{"$f":"(G5*$B$13+G6)*60","v":1697.1428571428571},{"$f":"(H5*$B$13+H6)*60","v":1817.1428571428571}]

{"sheet":"Kayaku 3025","index":6,"n_rows":13,"n_cols":11,"rows_kept":13,"cut":false,"hidden":true,"merged":[]}
["Kayaku 3025"]
["Spin speed\n[rpm]","Film Thickness\n[um] - Datasheet",null,"Film Thickness\n[um]","Typical exposure dose\n[mJ/cm2]","Softbake Time","PEB Time","Dev time",null,null,"Update"]
[1000,60.7,null,50,250,15,5,8,null,null,"23.09 - spincurve"]
[null,null,null,20,150,10,3,5]
[2500,24.5,null,"linear - a",{"$f":"(E4-E3)/($D$4-$D$3)","v":3.3333333333333335},{"$f":"(F4-F3)/($D$4-$D$3)","v":0.16666666666666666},6.6666666666666666E-2,0.1]
[null,null,null,"linear - b",{"$f":"E4-E5*$D$4","v":83.333333333333329},{"$f":"F4-F5*$D$4","v":6.666666666666667},1.6666666666666667,3]
[4000,16.2,null,"ax+b"]
[]
[]
[]
[]
[null,"Target thickness\n[um]","Spin speed\n[rpm]","Exposure dose\n[mJ/cm2]","Softbake time [s]","PEB time [s]","Dev time [s]"]
["Zone 13",{"$f":"Summary!E11","v":100},{"$f":"(B13/45066)^(-1/0.958)","v":589.11122635844958},{"$f":"E5*$B$13+E6","v":416.66666666666669},{"$f":"(F5*$B$13+F6)*60","v":1400},{"$f":"(G5*$B$13+G6)*60","v":500.00000000000006},{"$f":"(H5*$B$13+H6)*60","v":780}]

{"sheet":"Kayaku 3050","index":7,"n_rows":13,"n_cols":11,"rows_kept":13,"cut":false,"hidden":true,"merged":[]}
["Kayaku 3050"]
["Spin speed\n[rpm]","Film Thickness\n[um] - Datasheet",null,"Film Thickness\n[um]","Typical exposure dose\n[mJ/cm2]","Softbake Time","PEB Time","Dev time",null,null,"Update"]
[null,null,null,100,250,45,5,15,null,null,"23.09 - spincurve"]
[null,null,null,40,150,15,3,7]
[2500,43.2,null,"linear - a",{"$f":"(E4-E3)/($D$4-$D$3)","v":1.6666666666666667},{"$f":"(F4-F3)/($D$4-$D$3)","v":0.5},3.3333333333333333E-2,0.13333333333333333]
[null,null,null,"linear - b",{"$f":"E4-E5*$D$4","v":83.333333333333329},{"$f":"F4-F5*$D$4","v":-5},{"$f":"G4-G5*$D$4","v":1.6666666666666667},1.666666666666667]
[4000,26.2,null,"ax+b"]
[5000]
[]
[]
[]
[null,"Target thickness\n[um]","Spin speed\n[rpm]","Exposure dose\n[mJ/cm2]","Softbake time [s]","PEB time [s]","Dev time [s]"]
["Zone 13",{"$f":"Summary!E11","v":100},{"$f":"(B13/178158)^(1/-1.064)","v":1135.71187304207},{"$f":"E5*$B$13+E6","v":250},{"$f":"(F5*$B$13+F6)*60","v":2700},{"$f":"(G5*$B$13+G6)*60","v":300},{"$f":"(H5*$B$13+H6)*60","v":900}]

{"sheet":"GM 1040","index":8,"n_rows":13,"n_cols":7,"rows_kept":13,"cut":false,"hidden":true,"merged":[]}
["GM 1040"]
["Spin speed\n[rpm]","Film Thickness\n[um]",null,"Film Thickness\n[um]","Typical exposure dose\n[mJ/cm2]"]
[2000,1.45,null,0.94,29]
[4000,0.94,null,1.45,39]
[null,null," ","linear - a",{"$f":"(E4-E3)/(D4-D3)","v":19.607843137254903}]
[null,null,null,"linear - b",{"$f":"E4-E5*D4","v":10.56862745098039}]
[null,null,null,"ax+b"]
[]
[]
[]
[]
[null,"Target thickness\n[um]","Spin speed\n[rpm]","Exposure dose\n[mJ/cm2]","Softbake time [min]","PEB time [min]","Dev time [min]"]
[null,{"$f":"Summary!E11","v":100},{"$f":"(B13/168.1)^(1/-0.625)","v":2.2956640936571633},{"$f":"E5*B13+E6","v":1971.3529411764707}]

{"sheet":"GM 1050","index":9,"n_rows":13,"n_cols":7,"rows_kept":13,"cut":false,"hidden":true,"merged":[]}
["GM 1050"]
["Spin speed\n[rpm]","Film Thickness\n[um]",null,"Film Thickness\n[um]","Typical exposure dose\n[mJ/cm2]"]
[2000,3.72,null,2.2999999999999998,45]
[4000,2.2999999999999998,null,3.72,55]
[null,null,null,"linear - a",{"$f":"(E4-E3)/(D4-D3)","v":7.0422535211267583}]
[null,null,null,"linear - b",{"$f":"E4-E5*D4","v":28.802816901408459}]
[null,null,null,"ax+b"]
[]
[]
[]
[]
[null,"Target thickness\n[um]","Spin speed\n[rpm]","Exposure dose\n[mJ/cm2]","Softbake time [min]","PEB time [min]","Dev time [min]"]
[null,{"$f":"Summary!E11","v":100},{"$f":"(B13/725.04)^(1/-0.694)","v":17.366593938400364},{"$f":"E5*B13+E6","v":733.02816901408437}]

{"sheet":"GM 1060","index":10,"n_rows":13,"n_cols":7,"rows_kept":13,"cut":false,"hidden":true,"merged":[]}
["GM 1060"]
["Spin speed\n[rpm]","Film Thickness\n[um]",null,"Film Thickness\n[um]","Typical exposure dose\n[mJ/cm2]"]
[2000,10.8,null,5.75,{"$f":"159*0.4*1.15","v":73.14}]
[4000,5.75,null,10.8,{"$f":"195*0.4*1.15","v":89.699999999999989}]
[null,null,null,"linear - a",{"$f":"(E4-E3)/(D4-D3)","v":3.2792079207920763}]
[null,null,null,"linear - b",{"$f":"E4-E5*D4","v":54.284554455445559}]
[null,null,null,"ax+b"]
[]
[]
[]
[]
[null,"Target thickness\n[um]","Spin speed\n[rpm]","Exposure dose\n[mJ/cm2]","Softbake time [min]","PEB time [min]","Dev time [min]"]
[null,{"$f":"Summary!E11","v":100},{"$f":"(B13/10849)^(1/-0.909)","v":173.44133008267735},{"$f":"E5*B13+E6","v":382.20534653465319}]

{"sheet":"GM 1070","index":11,"n_rows":13,"n_cols":7,"rows_kept":13,"cut":false,"hidden":true,"merged":[]}
["GM 1070"]
["Spin speed\n[rpm]","Film Thickness\n[um]",null,"Film Thickness\n[um]","Typical exposure dose\n[mJ/cm2]"]
[2000,38.5,null,18.399999999999999,{"$f":"265*0.4*1.15","v":121.89999999999999}]
[4000,18.399999999999999,null,38.5,{"$f":"354*0.4*1.15","v":162.83999999999997}]
[null,null,null,"linear - a",{"$f":"(E4-E3)/(D4-D3)","v":2.0368159203980092}]
[null,null,null,"linear - b",{"$f":"E4-E5*D4","v":84.42258706467662}]
[null,null,null,"ax+b"]
[]
[]
[]
[]
[null,"Target thickness\n[um]","Spin speed\n[rpm]","Exposure dose\n[mJ/cm2]","Softbake time [min]","PEB time [min]","Dev time [min]"]
[null,{"$f":"Summary!E11","v":100},{"$f":"(B13/126346)^(1/-1.065)","v":817.07950388164795},{"$f":"E5*B13+E6","v":288.10417910447757}]

{"sheet":"GM 1075","index":12,"n_rows":13,"n_cols":7,"rows_kept":13,"cut":false,"hidden":true,"merged":[]}
["GM 1075"]
["Spin speed\n[rpm]","Film Thickness\n[um]",null,"Film Thickness\n[um]","Typical exposure dose\n[mJ/cm2]"]
[2000,94.2,null,43,147]
[4000,43,null,94.2,174]
[null,null,null,"linear - a",{"$f":"(E4-E3)/(D4-D3)","v":0.52734375}]
[null,null,null,"linear - b",{"$f":"E4-E5*D4","v":124.32421875}]
[null,null,null,"ax+b"]
[]
[]
[]
[]
[null,"Target thickness\n[um]","Spin speed\n[rpm]","Exposure dose\n[mJ/cm2]","Softbake time [min]","PEB time [min]","Dev time [min]"]
[null,{"$f":"Summary!E11","v":100},{"$f":"(B13/511452)^(1/-1.131)","v":1902.0688943245525},{"$f":"E5*B13+E6","v":177.05859375}]