Laurell WS-650-23

To be read first:

  • SOP validation: Any material that is being spin-coated on the Laurell manual coater must be approved by the CMi Staff! A standard operating procedure (SOP) is required and must be validated to use any new material on the system.
  • Cross-Contamination: Different materials with non-compatible chemistry are being coated on the Laurell coater. Make sure to clean the chuck after each working session and, if necessary, exchange aluminum foils in the coater bowl. A dedicated trash-bin is available to throw away contaminated material.

  • Please immediately inform the CMi staff in case of problems with the equipment.

RESERVATION RULES AND BOOKING FEES POLICY:

  1. No booking restrictions.
  2. 24/7 booking/use is possible with CMi+1 extended access.
  3. Reservation names must correspond to operators.

Contents:

  1. Introduction
  2. Equipement description
  3. Users manuals
  4. Links
  5. Pictures gallery

I. Introduction

The Laurell manual coater line is equipped with a Laurell WS-650-23 spin-coating unit and two Präzitherm PZ 28-2 ET / PR 5 SR hotplate & controller units from Harry Gestigkeit GMBH. One hotplate is equipped with a cover and input for nitrogen gas for baking under N2 flow.

The Laurell coater line is dedicated to the coating of non-standard (i.e. other than novolak-based photoresists) thin films. This includes but is not restricted to:

  • Polymer molecules in aqueous solution for sacrificial layer applications: DEXTRAN, PAA, PSS, PVA, …
  • Spin-on dielectrics/glass, spin-on dopants (boron, phosphorous, etc…)
  • Conductive polymers: PEDOT:PSS, Nafion
  • Unsafe polymer/photoresists diluted with non-traditional, unsafe solvent: Omnicoat, ELPAC PA-5500 H, Solvene/PVDF, …

II. Equipment description

Laurell manual coater:

  • Compact spin-coater with in-deck configuration
  • Handle wafers up to 6″ diameter or 6″ x 6″ plates
  • Minimum chip size: 10mm * 10mm with adptator ring
  • Rotation speeds up to 12’000 RPM (recommended MAX 6000 RPM)
  • Acceleration up to 30’000 RPM/s

Available chucks:

Three different chucks (or adaptator) for different wafer sizes:

Präzitherm hotplates:

  • Precision hotplates PTZ 28-2 ET combined with PR 5 SR controller
  • Maximum tempearture 350 °C, precision +/- 0.5 °C
  • Hotplate surface 280 mm x 200 mm
  • Programmable temperature ramps with up to 5 steps
  • Second hotplate equipped with cover and N2 line for nitrogen ambiant curing

III. User manuals

IV. Links

V. Pictures gallery