The ebeam lithography at CMi is performed with the EBPG5000ES system capable of writing smaller than 10nm features and placing structures on a substrate with an accuracy of less than 20nm.
- 100keV thermal field emission gun,
- Gaussian beam,
- 50MHz pattern generator,
- direct write mark detection & alignment software,
- holders for 50mm, 100mm, 150mm wafers, 5inch masks and smaller piece parts.
The system is housed in a custom cleanroom which maintains a temperature of 21°C ± 0.1°C. Next to it is a dedicated resist processing lab. Data preparation, tool operation and processing are performed by users after a thorough (but rapid) training.
Stuff to know before you can start to use the tool.
- Booking rules
- Available training