Publications

Magnetic field configurational study on a helicon-based plasma source for future neutral beam systems

K. M. Ahmed; R. Agnello; S. Bechu; G. Cartry; H. P. L. de Esch et al. 

Plasma Sources Science & Technology. 2019-09-01. Vol. 28, num. 9, p. 095005. DOI : 10.1088/1361-6595/ab3705.

Gas breakdown mitigation in satellite slip rings

F. Avino; P. J. L. Martens; A. A. Howling; I. Furno 

Aerospace Science and Technology. 2019. Vol. 85, p. 229-233. DOI : 10.1016/j.ast.2018.12.010.

Two-fluid plasma model for radial Langmuir probes as a converging nozzle with sonic choked flow, and sonic passage to supersonic flow

A. A. Howling; P. Guittienne; I. Furno 

Physics of Plasmas. 2019. Vol. 26, num. 4, p. 044502. DOI : 10.1063/1.5084115.

Cavity ring-down spectroscopy to measure negative ion density in a helicon plasma source for fusion neutral beams

R. Agnello; M. Barbisan; I. Furno; P. Guittienne; A. A. Howling et al. 

Review Of Scientific Instruments. 2018-10-01. Vol. 89, num. 10, p. 103504. DOI : 10.1063/1.5044504.

Two-fluid solutions for Langmuir probes in collisionless and isothermal plasma, over all space and bias potential

P. Guittienne; A. A. Howling; I. Furno 

Physics Of Plasmas. 2018-09-01. Vol. 25, num. 9, p. 093519. DOI : 10.1063/1.5041496.

RF bias to suppress post-oxidation of mu c-Si:H films deposited by inductively-coupled plasma using a planar RF resonant antenna

P. Demolon; P. Guittienne; A. A. Howling; S. Jost; R. Jacquier et al. 

Vacuum. 2018. Vol. 147, p. 58-64. DOI : 10.1016/j.vacuum.2017.10.020.

Complex image method for RF antenna-plasma inductive coupling calculation in planar geometry: II. Measurements on a resonant network (vol 24, 065015, 2015)

P. Guittienne; R. Jacquier; A. A. Howling; I. Furno 

Plasma Sources Science & Technology. 2017. Vol. 26, num. 12, p. 129501. DOI : 10.1088/1361-6595/aa9645.

Ion heating and flows in a high power helicon source

D. S. Thompson; R. Agnello; I. Furno; A. Howling; R. Jacquier et al. 

Physics Of Plasmas. 2017. Vol. 24, num. 6, p. 063517. DOI : 10.1063/1.4985328.

Electromagnetic, complex image model of a large area RF resonant antenna as inductive plasma source

P. Guittienne; R. Jacquier; A. Howling; I. Furno 

Plasma Sources Science and Technology. 2017. Vol. 26, num. 3, p. 035010. DOI : 10.1088/1361-6595/aa59d6.

Spectroscopic characterisation of H2 and D2 helicon plasmas generated by a resonant antenna for neutral beam applications in fusion

C. Marini; R. Agnello; B. P. Duval; I. Furno; A. A. Howling et al. 

Nuclear Fusion. 2017. Vol. 57, num. 3, p. 036024. DOI : 10.1088/1741-4326/aa53eb.

Negative ion source development for a photoneutralization based neutral beam system for future fusion reactors

A. Simonin; R. Agnello; S. Bechu; J. M. Bernard; C. Blondel et al. 

New Journal Of Physics. 2016. Vol. 18, p. 125005. DOI : 10.1088/1367-2630/18/12/125005.

R&D around a photoneutralizer-based NBI system (Siphore) in view of a DEMO Tokamak steady state fusion reactor

A. Simonin; J. Achard; K. Achkasov; S. Bechu; C. Baudouin et al. 

Nuclear Fusion. 2015. Vol. 55, num. 12, p. 123020. DOI : 10.1088/0029-5515/55/12/123020.

Complex image method for RF antenna-plasma inductive coupling calculation in planar geometry. Part I: basic concepts

A. A. Howling; P. Guittienne; R. Jacquier; I. Furno 

Plasma Sources Science & Technology. 2015. Vol. 24, num. 6, p. 065014. DOI : 10.1088/0963-0252/24/6/065014.

Complex image method for RF antenna-plasma inductive coupling calculation in planar geometry. Part II: measurements on a resonant network

P. Guittienne; R. Jacquier; A. A. Howling; I. Furno 

Plasma Sources Science & Technology. 2015. Vol. 24, num. 6, p. 065015. DOI : 10.1088/0963-0252/24/6/065015.

Industrial plasmas in academia

C. Hollenstein; A. A. Howling; P. Guittienne; I. Furno 

Plasma Physics And Controlled Fusion. 2015. Vol. 57, num. 1. DOI : 10.1088/0741-3335/57/1/014010.

Analysis of resonant planar dissipative network antennas for rf inductively coupled plasma sources

P. Guittienne; A. A. Howling; C. Hollenstein 

Plasma Sources Science & Technology. 2014. Vol. 23, num. 1, p. 015006. DOI : 10.1088/0963-0252/23/1/015006.

Generation of Whistler-Wave Heated Discharges with Planar Resonant rf Networks

P. Guittienne; A. A. Howling; C. Hollenstein 

Physical Review Letters. 2013. Vol. 111, num. 12, p. 125005. DOI : 10.1103/PhysRevLett.111.125005.

Resonant RF network antennas for large-area and large-volume inductively coupled plasma sources

C. Hollenstein; P. Guittienne; A. A. Howling 

Plasma Sources Science & Technology. 2013. Vol. 22, num. 5, p. 055021. DOI : 10.1088/0963-0252/22/5/055021.

Funnelling of rf current via a plasmoid through a grid hole in an rf capacitive plasma reactor

M. Chesaux; A. A. Howling; C. Hollenstein 

Plasma Sources Science & Technology. 2013. Vol. 22, num. 5, p. 055006. DOI : 10.1088/0963-0252/22/5/055006.

Direct current breakdown in gases for complex geometries from high vacuum to atmospheric pressure

R. Schnyder; A. A. Howling; D. Bommottet; C. Hollenstein 

Journal Of Physics D-Applied Physics. 2013. Vol. 46, num. 28, p. 285205. DOI : 10.1088/0022-3727/46/28/285205.

Low ion energy RF reactor using an array of plasmas through a grounded grid

M. Chesaux; A. A. Howling; C. Hollenstein; D. Domine; U. Kroll 

Journal Of Vacuum Science & Technology A. 2013. Vol. 31, num. 2, p. 021302. DOI : 10.1116/1.4790423.

Plasma generation by inductive coupling with a planar resonant RF network antenna (vol 45, 082001, 2012)

S. Lecoultre; P. Guittienne; A. A. Howling; P. Fayet; C. Hollenstein 

Journal Of Physics D-Applied Physics. 2012. Vol. 45, num. 40, p. 409502. DOI : 10.1088/0022-3727/45/40/409502.

Resonant planar antenna as an inductive plasma source

P. Guittienne; S. Lecoultre; P. Fayet; J. Larrieu; A. A. Howling et al. 

Journal Of Applied Physics. 2012. Vol. 111, p. 083305. DOI : 10.1063/1.4705978.

Plasma generation by inductive coupling with a planar resonant RF network antenna

S. Lecoultre; P. Guittienne; A. A. Howling; P. Fayet; C. Hollenstein 

Journal Of Physics D-Applied Physics. 2012. Vol. 45, p. 082001. DOI : 10.1088/0022-3727/45/8/082001.

Plasma deposition in an ideal showerhead reactor: a two-dimensional analytical solution

A. A. Howling; B. Legradic; M. Chesaux; C. Hollenstein 

Plasma Sources Science & Technology. 2012. Vol. 21, p. 015005. DOI : 10.1088/0963-0252/21/1/015005.

Radio frequency breakdown between structured parallel plate electrodes with a millimetric gap in low pressure gases

B. Legradic; A. A. Howling; C. Hollenstein 

Physics of Plasmas. 2010. Vol. 17, num. 10, p. 102111. DOI : 10.1063/1.3490190.

Hydrogen-dominated plasma, due to silane depletion, for microcrystalline silicon deposition

A. A. Howling; R. Sobbia; C. Hollenstein 

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 2010. Vol. 28, num. 4, p. 989. DOI : 10.1116/1.3328824.

Input silane concentration effect on the a-Si:H to uc-Si:H transition width

A. Feltrin; B. Strahm; G. Bugnon; F. Sculati-Meillaud; C. Ballif et al. 

Solar Energy Materials and Solar Cells. 2010. Vol. 94, num. 3, p. 432-435. DOI : 10.1016/j.solmat.2009.10.021.

Uniformity of silicon microcrystallinity in large area RF capacitive reactors

B. Strahm; C. Hollenstein; A. Howling 

Progress in Photovoltaics. 2008. Vol. 16, p. 687-691. DOI : 10.1002/pip.857.

Microcrystalline silicon deposited at high rate on large areas from pure silane with efficient gas utilization

B. Strahm; A. A. Howling; L. Sansonnens; C. Hollenstein; U. Kroll et al. 

Solar Energy Materials and Solar Cells. 2007. Vol. 91, num. 6, p. 495-502. DOI : 10.1016/j.solmat.2006.10.024.

Electromagnetic sources of nonuniformity in large area capacitive reactors

A. A. Howling; L. Sansonnens; C. Hollenstein 

Thin Solid Films. 2007. Vol. 515, num. 12, p. 5059-5064. DOI : 10.1016/j.tsf.2006.10.093.

Optimization of the microcrystalline silicon deposition efficiency

B. Strahm; A. A. Howling; L. Sansonnens; C. Hollenstein 

Journal of Vacuum Science & Technology A. 2007. Vol. 25, num. 4, p. 1198-1202. DOI : 10.1116/1.2433985.

Plasma silane concentration as a determining factor for the transition from amorphous to microcrystalline silicon in SiH4/H-2 discharges

B. Strahm; A. A. Howling; L. Sansonnens; C. Hollenstein 

Plasma Sources Science & Technology. 2007. Vol. 16, num. 1, p. 80-89. DOI : 10.1088/0963-0252/16/1/011.

Electromagnetic field nonuniformities in large area, high-frequency capacitive plasma reactors, including electrode asymmetry effects

L. Sansonnens; A. A. Howling; C. Hollenstein 

Plasma Sources Science & Technology. 2006. Vol. 15, num. 3, p. 302-313. DOI : 10.1088/0963-0252/15/3/002.

Application of the shaped electrode technique to a large area rectangular capacitively coupled plasma reactor to suppress standing wave nonuniformity

L. Sansonnens; H. Schmidt; A. A. Howling; C. Hollenstein; C. Ellert et al. 

Journal of Vacuum Science & Technology A. 2006. Vol. 24, num. 4, p. 1425-1430. DOI : 10.1116/1.2189266.

Probe measurements of plasma potential nonuniformity due to edge asymmetry in large-area radio-frequency reactors: the telegraph effect

A. Howling; L. Derendinger; L. Sansonnens; H. Schmidt; C. Hollenstein et al. 

Journal of Applied Physics. 2005. Vol. 97, num. 12, p. 123308. DOI : 10.1063/1.1940136.

Comment on “Ion energy uniformity in high-frequency capacitive discharges” [Appl. Phys. Lett. 86, 021501 (2005)]

A. A. Howling; L. Sansonnens; H. Schmidt; C. Hollenstein 

Applied Physics Letters. 2005. Vol. 87, num. 7. DOI : 10.1063/1.2012528.

Measurements and consequences of nonuniform radio frequency plasma potential due to surface asymmetry in large area radio frequency capacitive reactors

L. Sansonnens; B. Strahm; L. Derendinger; A. A. Howling; C. Hollenstein et al. 

Journal of Vacuum Science & Technology A. 2005. Vol. 23, num. 4, p. 922-926. DOI : 10.1116/1.1868572.

High Efficiency p-i-n a-Si:H Solar Cells with Low Boron Cross-Contamination Prepared in a Large Area Single-Chamber PECVD Reactor

U. Kroll; C. Bucher; S. Benagli; I. Schönbächler; J. Meier et al. 

Thin Solid Films. 2004. Vol. 451-452, p. 525-530. DOI : 10.1016/j.tsf.2003.11.036.

Reduction of the boron cross-contamination for plasma deposition of p–i–n devices in a single-chamber large area radio-frequency reactor

J. Ballutaud; C. Bucher; C. Hollenstein; A. A. Howling; U. Kroll et al. 

Thin Solid Films. 2004. Vol. 468, num. 1-2, p. 222-225. DOI : 10.1016/j.tsf.2004.05.034.

Nonuniform radio-frequency plasma potential due to edge asymmetry in large-area radio-frequency reactors

A. A. Howling; L. Sansonnens; J. Ballutaud; C. Hollenstein; J. P. M. Schmitt 

Journal of Applied Physics. 2004. Vol. 96, num. 10, p. 5429-5440. DOI : 10.1063/1.1803608.

Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor

H. Schmidt; L. Sansonnens; A. A. Howling; C. Hollenstein; M. Elyaakoubi et al. 

Journal of Applied Physics. 2004. Vol. 95, num. 9, p. 4559-4564. DOI : 10.1063/1.1690096.

Anion reactions in silane plasma

A. Gallagher; A. A. Howling; C. Hollenstein 

Journal of Applied Physics. 2002. Vol. 91, num. 9, p. 5571-5580. DOI : 10.1063/1.1459758.

Electrostatic charging: Mechanism of substrate charging after plasma processing

A. Belinger; P. Bulkin; L. Delaunay; M. Elyaakoubi; J. Perrin et al. 

Panels (Business & Technical news from Unaxis Displays). 2001.  p. 19-21.

Rapid deposition of hydrogenated microcrystalline silicon by a high current DC discharge

D. Franz; F. Grangeon; T. Delachaux; A. A. Howling; C. Hollenstein et al. 

Thin Solid Films. 2001. Vol. 383, num. 1-2, p. 11-14. DOI : 10.1016/S0040-6090(00)01600-X.

Power laws for the spatial dependence of electrical parameters in the high-voltage capacitive RF sheath

H. Muller; A. A. Howling; C. Hollenstein 

Ieee Transactions on Plasma Science. 2000. Vol. 28, num. 5, p. 1713-1719. DOI : 10.1109/27.901258.

The physics of plasma-enhanced chemical vapour deposition for large-area coating: industrial application to flat panel displays and solar cells

J. Perrin; J. Schmitt; C. Hollenstein; A. Howling; L. Sansonnens 

Plasma Physics and Controlled Fusion. 2000. Vol. 42, p. B353-B363. DOI : 10.1088/0741-3335/42/12B/326.

A gas flow uniformity study in large-area showerhead reactors for RF plasma deposition

L. Sansonnens; A. A. Howling; C. Hollenstein 

Plasma Sources Science & Technology. 2000. Vol. 9, num. 2, p. 205-209. DOI : 10.1088/0963-0252/9/2/314.